Piezoelectric device and method of forming the same

ABSTRACT

A piezoelectric device including a substrate, a metal-insulator-metal element, a hydrogen blocking layer, a passivation layer, a first contact terminal and a second contact terminal is provided. The metal-insulator-metal element is disposed on the substrate. The hydrogen blocking layer is disposed on the metal-insulator-metal element. The passivation layer covers the hydrogen blocking layer and the metal-insulator-metal element. The first contact terminal is electrically connected to the metal-insulator-metal element. The second contact terminal is electrically connected to the metal-insulator-metal element.

BACKGROUND

Piezoelectric devices are used in many fields and the global demand forpiezoelectric devices becomes strong nowadays.

BRIEF DESCRIPTION OF THE DRAWINGS

Aspects of the disclosure are best understood from the followingdetailed description when read with the accompanying figures. It isnoted that, in accordance with the standard practice in the industry,various features are not drawn to scale. In fact, the criticaldimensions of the various features may be arbitrarily increased orreduced for clarity of discussion.

FIG. 1 is a schematic cross-sectional view illustrating a piezoelectricdevice in accordance with some embodiments.

FIG. 2 is a schematic top view illustrating a piezoelectric device inaccordance with some embodiments.

FIGS. 3A-3I are schematic cross-sectional views illustrating variousstages of a method of forming the piezoelectric device in FIG. 1 andFIG. 2 in accordance with some embodiments.

FIG. 4 is a schematic cross-sectional view illustrating a piezoelectricdevice in accordance with alternative embodiments.

FIG. 5 is a schematic cross-sectional view illustrating a piezoelectricdevice in accordance with alternative embodiments.

FIG. 6A and FIG. 6B are schematic views illustrating one exemplaryapplication of the piezoelectric device in accordance with someembodiments.

DETAILED DESCRIPTION

The following disclosure provides many different embodiments, orexamples, for implementing different features of the provided subjectmatter. Specific examples of components and arrangements are describedbelow to simplify the present disclosure. These are, of course, merelyexamples and are not intended to be limiting. For example, the formationof a first feature over or on a second feature in the description thatfollows may include embodiments in which the first and second featuresare formed in direct contact, and may also include embodiments in whichadditional features may be formed between the first and second features,such that the first and second features may not be in direct contact. Inaddition, the present disclosure may repeat reference numerals and/orletters in the various examples. This repetition is for the purpose ofsimplicity and clarity and does not in itself dictate a relationshipbetween the various embodiments and/or configurations discussed.

Further, spatially relative terms, such as “beneath”, “below”, “lower”,“on”, “over”, “overlying”, “above”, “upper” and the like, may be usedherein for ease of description to describe one element or feature'srelationship to another element(s) or feature(s) as illustrated in thefigures. The spatially relative terms are intended to encompassdifferent orientations of the device in use or operation in addition tothe orientation depicted in the figures. The apparatus may be otherwiseoriented (rotated 90 degrees or at other orientations) and the spatiallyrelative descriptors used herein may likewise be interpretedaccordingly.

Piezoelectric devices are devices utilizing piezoelectric effects,including piezoelectric sensors, actuators, transducers, transformersand motors. A piezoelectric device (such as an actuator) may include apiezoelectric layer stacked between a first electrode and a secondelectrode. When a voltage is applied, the electrical field generated bythe applied voltage will cause the piezoelectric layer to stretch orcompress in a direction normal to the piezoelectric layer (i.e. deform).The deformation of the piezoelectric layer is translated into a physicaldisplacement. Such physical displacement may be used to move or positionobjects in various kinds of mechanical systems and optical systems. Theamount of the physical displacement or movement generally depends uponthe voltage applied as well as the piezoelectric coefficient of thepiezoelectric layer (i.e. the efficiency of the piezoelectric materialin transferring the electrical energy to mechanical energy). Theperformance of the piezoelectric devices may be determined by thecharacteristics of the piezoelectric layer in the piezoelectric devices.For improving the reliability of the piezoelectric devices, the amountof the hydrogen-ions present in the piezoelectric layer of thepiezoelectric device is better to be reduced or minimized.

During the manufacturing processes, hydrogen-ion containing processingmay be performed after the formation of the piezoelectric layer, whichmay cause the inclusion of the hydrogen-ions into the piezoelectriclayer and degrade the reliability of the piezoelectric devices.According to some embodiments, it is desirable to form a blockingmaterial or a shielding layer deterring and hindering the hydrogen-ionsfrom entering into the piezoelectric layer before performinghydrogen-ion containing processing.

FIG. 1 is a schematic cross-sectional view illustrating a piezoelectricdevice in accordance with some embodiments. FIG. 2 is a schematic topview illustrating a piezoelectric device in accordance with someembodiments. FIG. 2 is a cross-sectional view taken along line A-A′ andline B-B′ of FIG. 1 . It should be noted that for simplicity, certainelements of the piezoelectric device 10 in FIG. 2 are omitted.

Referring to FIG. 1 and FIG. 2 , the piezoelectric device 10 includes asubstrate 100, a first electrode 101, a piezoelectric layer 102, asecond electrode 103, a hydrogen blocking layer 104, a passivation layer105, a first contact terminal 106 and a second contact terminal 107. Insome embodiments, the first electrode 101 is disposed on the substrate100, the piezoelectric layer 102 is disposed on the first electrode 101,the second electrode 103 is disposed on the piezoelectric layer 102, thehydrogen blocking layer 104 is disposed on the second electrode 103, thepassivation layer 105 covers the hydrogen blocking layer 104, the secondelectrode 103, the piezoelectric layer 102 and the first electrode 101,the first contact terminal 106 is electrically connected to the firstelectrode 101, and the second contact terminal 107 is electricallyconnected to the second electrode 103.

In FIG. 1 and FIG. 2 , the first electrode 101, the piezoelectric layer102 and the second electrode 103 are sequentially stacked on thesubstrate 100. In other words, the piezoelectric layer 102 is locatedbetween the first electrode 101 and the second electrode 103. In someembodiments, the first electrode 101 includes a first metal pattern101A, and the second electrode 103 includes a second metal pattern 103A.In some embodiments, the material of the piezoelectric layer 102includes a piezoelectric ceramic material such as lead zirconatetitanate (PZT). Specifically, the stacked structure of the firstelectrode 101, the piezoelectric layer 102 and the second electrode 103constitutes a metal-insulator-metal element MIM. That is to say, in someembodiments, the metal-insulator-metal element MIM is disposed on thesubstrate 100, the hydrogen blocking layer 104 is disposed on themetal-insulator-metal element MIM, the passivation layer 105 covers thehydrogen blocking layer 104 and the metal-insulator-metal element MIM,and the first contact terminal 106 and the second contact terminal 107are electrically connected to the metal-insulator-metal element MIM.

Still referring to FIG. 1 , from the top view, the first electrode 101is designed to be a substantially circular electrode with a contactportion P1 protruding from the contour of the circular electrode, andthe second electrode 103 is designed to be a substantially circularelectrode with a contact portion P2 protruding from the contour of thecircular electrode. However, the disclosure is not limited thereto. Insome alternative embodiments, the shapes of the patterns of the firstelectrode 101 and the second electrode 103 may be oval shapes,tetragonal, hexagonal or polygonal shapes or any suitable shapes fromthe top view. In addition, the shape of the pattern of the piezoelectriclayer 102 is designed, corresponding to the shapes of the top and bottomelectrodes 101, 103, to be a circular shape. From the top view as shownin FIG. 1 , the shapes of the first electrode 101, the piezoelectriclayer 102 and the second electrode 103 are arranged as concentriccircles. However, the disclosure is not limited thereto. In somealternative embodiments, the shape of the pattern of the piezoelectriclayer 102 may designed to be a polygonal shape or any suitable shapefrom the top view. In yet alternative embodiments, the shapes of thefirst electrode 101, the piezoelectric layer 102 and the secondelectrode 103 may be arranged as non-concentric circles.

Continue referring to FIG. 1 , from the top view, the span of the firstelectrode 101 is greater than the span of the piezoelectric layer 102,and the span of the piezoelectric layer 102 is greater than the span ofthe second electrode 103. From another point of view, the firstelectrode 101, the piezoelectric layer 102 and the second electrode 103constitute a staircase shaped stacked-structure, as shown in thecross-section of FIG. 2 .

In some embodiments, the first contact terminal 106 is electricallyconnected to the first electrode 101 through a first contact hole H1 inthe passivation layer 105 and the hydrogen blocking layer 104, and thesecond contact terminal 107 is electrically connected to the secondelectrode 103 through a second contact hole H2 in the passivation layer105 and the hydrogen blocking layer 104. In detail, the first contactterminal 106 is electrically connected to the contact portion P1 of thefirst electrode 101, and the second contact terminal 107 is electricallyconnected to the contact portion P2 of the second electrode 103. In someembodiments, the first contact terminal 106 and the second contactterminal 107 both may serve as external input/output terminals of thepiezoelectric device 10. When a voltage is applied between the firstcontact terminal 106 and the second contact terminal 107, the samevoltage is applied between the first electrode 101 and the secondelectrode 103. The electrical field caused by the applied voltage cancause the piezoelectric layer 102 to stretch or compress in a directionnormal to the surface of the substrate 100. The stretch and compressionof the piezoelectric layer 102 is translated into a physicaldisplacement for controlling a mechanical system or optical system.

In some embodiments, the hydrogen blocking layer 104 includes a firsthydrogen blocking layer 104 a, a second hydrogen blocking layer 104 band a third hydrogen blocking layer 104 c. That is to say, in someembodiments, the hydrogen blocking layer 104 is a multilayer structure.Specifically, as shown in FIG. 2 , the first hydrogen blocking layer 104a covers and contacts the top surface of the second electrode 103, thesecond hydrogen blocking 104 b layer covers the first hydrogen blockinglayer 104 a and contacts the top surface of the piezoelectric layer 102,and the third hydrogen blocking layer 104 c covers the second hydrogenblocking layer 104 b and contacts the top surface of the first electrode101. In other words, during the fabrication process of the piezoelectricdevice 10, the hydrogen blocking layer 104 covers and protects theoutermost top surface of the metal-insulator-metal element MIM. Becausethe hydrogen blocking layer 104 covers and protects the outermost topsurface of the metal-insulator-metal element MIM, the hydrogen-ions ofthe photoresist layer are barred from penetrating into themetal-insulator-metal element MIM by the hydrogen blocking layer 104. Assuch, no hydrogen-ions or minimal hydrogen-ions are included in thepiezoelectric layer 102 of the piezoelectric device 10 and thepiezoelectric characteristics of the piezoelectric layer 102 aremaintained. This is to say, better reliability of the piezoelectricdevice 10 can be achieved due to the hydrogen blocking layer 104.

The method of forming the piezoelectric device 10 will be described indetails below with reference to FIG. 3A to FIG. 3I. FIGS. 3A-3I areschematic cross-sectional views illustrating various stages of a methodof forming the piezoelectric device in FIG. 1 and FIG. 2 in accordancewith some embodiments.

Referring to FIG. 3A, a substrate 100 is provided. In some embodiments,the material of the substrate 100 may include, for example, silicon,glass, silicon dioxide, aluminum oxide, or the like. Referring to FIG.3A, a first conductive layer 108, a piezoelectric material layer 109, asecond conductive layer 110 and a first hydrogen blocking material layer111 are sequentially formed on the substrate 100. In other words, thepiezoelectric material layer 109 is located between the first conductivelayer 108 and the second conductive layer 110, and the first hydrogenblocking material layer 111 is located on the second conductive layer110. In some embodiments, the materials of the first conductive layer108 and the second conductive layer 110 may respectively include, butnot limited to, molybdenum (Mo), titanium nitride (TiN), aluminum (Al),platinum (Pt), gold (Au), tungsten (W), a combination thereof, or thelike. In some embodiments, the material of the first conductive layer108 is the same as the material of the second conductive layer 110. Insome alternative embodiments, the material of the first conductive layer108 is different from the material of the second conductive layer 110.In some embodiments, the first conductive layer 108 and the secondconductive layer 110 each may has a thickness that is in a range fromabout 200 Å to about 2000 Å. In some embodiments, the first conductivelayer 108 and the second conductive layer 110 each may be formed with adeposition process, such as chemical vapor deposition (CVD), physicalvapor deposition (PVD), or atomic layer deposition (ALD).

In some embodiments, the material of the piezoelectric material layer109 may include, but not limited to, aluminum nitride (AlN), leadzirconate titanate (PZT), gallium orthophosphate (GaPO₄), langasite(La₃Ga.₅SiO₁₄), barium titanate (BaTiO₃), potassium niobate (KNbO₃),lithium niobate (LiNbO₃), lithium tantalate (LiTaO₃), sodium tungstate(Na₂WO₃), zinc oxide (ZnO), a combination thereof, or the like. In someembodiments, the piezoelectric material layer 109 may has a thicknessthat is in a range from about 2000 Å to about 20000 Å. In someembodiments, the piezoelectric material layer 109 may be formed with PVDor a sol-gel process.

In some embodiments, the material of the first hydrogen blockingmaterial layer 111 may include a metal oxide. Examples of the metaloxide may include Al₂O₃, TiO₂, Fe₂O₃, ZrO₂, ZnO, CuO or Ta₂O₅. In someembodiments, the first hydrogen blocking material layer 111 may has athickness that is greater than 200 Å. In detail, owing to having thethickness greater than 200 Å, the first hydrogen blocking layer 104 aformed from the first hydrogen blocking material layer 111 has goodblocking ability for hydrogen-ions. In some embodiments, the firsthydrogen blocking material layer 111 may be formed with a depositionprocess, such as ALD or PVD. In detail, the first hydrogen blockingmaterial layer 111 is formed with ALD, thereby the first hydrogenblocking material layer 111 is dense enough for the first hydrogenblocking layer 104 a formed from the first hydrogen blocking materiallayer 111 to have good blocking ability for hydrogen-ions. Moreover, thefirst hydrogen blocking material layer 111 is formed with PVD, therebythere is no additional hydrogen-ions from the first hydrogen blockingmaterial layer 111.

Referring to FIG. 3B, a first photolithography step is performed to forma first photoresist layer PR1 on the first hydrogen blocking materiallayer 111. In other words, the first hydrogen blocking material layer111 is located between the first photoresist layer PR1 and the secondconductive layer 110. In some embodiments, the first photolithographystep for forming the first photoresist layer PR1 may include thefollowing steps of coating a photoresist material on the first hydrogenblocking material layer 111, exposing the photoresist material with aphotolithography mask (or called photomask), and developing the exposedphotoresist material. In some embodiments, the first photoresist layerPR1 includes a positive photoresist material which is photo-solubilizedwhen exposed to light. In some alternative embodiments, the firstphotoresist layer PR1 includes a negative photoresist material.

Referring to FIG. 3B and FIG. 3C, a first etching step is performed tothe first hydrogen blocking material layer 111 and the second conductivelayer 110 by using the first photoresist layer PR1 as an etch mask, suchthat the first hydrogen blocking material layer 111 and the secondconductive layer 110 are etched to form the first hydrogen blockinglayer 104 a and the second electrode 103, and the portions of thepiezoelectric material layer 109 that are not covered by the firsthydrogen blocking layer 104 a and the second electrode 103 are exposed.In other words, the first hydrogen blocking material layer 111 and thesecond conductive layer 110 are simultaneously patterned by using thesame mask to form the first hydrogen blocking layer 104 a and the secondelectrode 103. That is to say, the first hydrogen blocking layer 104 aand the second electrode 103 have substantially identical layout. Insome embodiments, the first etching step is an ion-beam etching stepused to pattern the first hydrogen blocking material layer 111 and thesecond conductive layer 110 in a single patterning process. In someembodiments, during the ion-beam etching step, there is substantially noetching selectivity between the first hydrogen blocking material layer111 and the second conductive layer 110, which means that the etchingrate ratio of the material of the first hydrogen blocking material layer111 to the material of the second conductive layer 110 issubstantially 1. It is noted that, as the first hydrogen blockingmaterial layer 111 is formed between the first photoresist layer PR1 andthe second conductive layer 110, during the first etching step, thefirst hydrogen blocking layer 104 a helps prevent the hydrogen-ions inthe first photoresist layer PR1 from penetrating into the secondelectrode 103.

As shown in FIG. 3C, the first hydrogen blocking layer 104 a is locatedbetween the first photoresist layer PR1 and the second electrode 103.From another point of view, the first hydrogen blocking layer 104 a isformed to physically contact the second electrode 103 at the top surfaceof the second electrode 103. Details of the first hydrogen blockinglayer 104 a and the second electrode 103 have been described above, andwill not be iterated herein.

Referring to FIG. 3C and FIG. 3D, after the first hydrogen blockinglayer 104 a and the second electrode 103 are formed, the firstphotoresist layer PR1 is removed. In some embodiments, the firstphotoresist layer PR1 may be removed by a stripping process, such as adry stripping process, a wet stripping process or a combination thereof.As mentioned above, since the first hydrogen blocking layer 104 a islocated between the first photoresist layer PR1 and the second electrode103, during the stripping process of the first photoresist layer PR1,the first hydrogen blocking layer 104 a helps prevent the hydrogen-ionsin the first photoresist layer PR1 from penetrating into the secondelectrode 103.

Still referring to FIG. 3D, a second hydrogen blocking material layer112 is formed on the first hydrogen blocking layer 104 a and the secondelectrode 103. In addition, the second hydrogen blocking material layer112 is formed on the portions of the piezoelectric material layer 109that are not covered by the first hydrogen blocking layer 104 a and thesecond electrode 103. In some embodiments, the second hydrogen blockingmaterial layer 112 is a conformal layer. In detail, the second hydrogenblocking material layer 112 conformally and completely covers the topsurface and the sidewall of the first hydrogen blocking layer 104 a, thesidewall of the second electrode 103, and the portions of thepiezoelectric material layer 109 that are not covered by the firsthydrogen blocking layer 104 a and the second electrode 103. However, thedisclosure is not limited thereto. In some alternative embodiments, thesecond hydrogen blocking material layer 112 is not a conformal layer.

In some embodiments, the material of the second hydrogen blockingmaterial layer 112 may include a metal oxide. Examples of the metaloxide may include Al₂O₃, TiO₂, Fe₂O₃, ZrO₂, ZnO, CuO or Ta₂O₅. In someembodiments, the material of the second hydrogen blocking material layer112 is the same as the material of the first hydrogen blocking materiallayer 111. In some alternative embodiments, the material of the secondhydrogen blocking material layer 112 is different from the material ofthe first hydrogen blocking material layer 111.

In some embodiments, the second hydrogen blocking material layer 112 mayhas a thickness that is greater than 200 Å. In detail, owing to havingthe thickness greater than 200 Å, the second hydrogen blocking layer 104b formed from the second hydrogen blocking material layer 112 has goodblocking ability for hydrogen-ions. In some embodiments, the thicknessof the second hydrogen blocking material layer 112 is the same as thethickness of the first hydrogen blocking material layer 111. In somealternative embodiments, the thickness of the second hydrogen blockingmaterial layer 112 is different from the thickness of the first hydrogenblocking material layer 111.

In some embodiments, the second hydrogen blocking material layer 112 maybe formed with a deposition process, such as ALD or PVD. In detail, thesecond hydrogen blocking material layer 112 is formed with ALD, therebythe second hydrogen blocking material layer 112 is dense enough for thesecond hydrogen blocking layer 104 b formed from the second hydrogenblocking material layer 112 to have good blocking ability forhydrogen-ions. Moreover, the second hydrogen blocking material layer 112is formed with PVD, thereby there is no additional hydrogen-ions fromthe second hydrogen blocking material layer 112.

Continue referring to FIG. 3D, a second photolithography step isperformed to form a second photoresist layer PR2 on the second hydrogenblocking material layer 112. In other words, the second hydrogenblocking material layer 112 is located between the second photoresistlayer PR2 and the second electrode 103, and between the secondphotoresist layer PR2 and the piezoelectric material layer 109. In someembodiments, the second photolithography step for forming the secondphotoresist layer PR2 may include the following steps of coating aphotoresist material on the second hydrogen blocking material layer 112,exposing the photoresist material with a photolithography mask (orcalled photomask), and developing the exposed photoresist material. Insome embodiments, the second photoresist layer PR2 includes a positivephotoresist material which is photo-solubilized when exposed to light.In some alternative embodiments, the second photoresist layer PR2includes a negative photoresist material.

Referring to FIG. 3D and FIG. 3E, a second etching step is performed tothe second hydrogen blocking material layer 112 and the piezoelectricmaterial layer 109 by using the second photoresist layer PR2 as an etchmask, such that the second hydrogen blocking material layer 112 and thepiezoelectric material layer 109 are etched to form the second hydrogenblocking layer 104 b and the piezoelectric layer 102, and the portionsof the first conductive layer 108 that are not covered by the secondhydrogen blocking layer 104 b and the piezoelectric layer 102 areexposed. In other words, the second hydrogen blocking material layer 112and the piezoelectric material layer 109 are simultaneously patterned byusing the same mask to form the second hydrogen blocking layer 104 b andthe piezoelectric layer 102. That is to say, the second hydrogenblocking layer 104 b and the piezoelectric layer 102 have substantiallyidentical layout. In some embodiments, the second etching step is anion-beam etching step used to pattern the second hydrogen blockingmaterial layer 112 and the piezoelectric material layer 109 in a singlepatterning process. In detail, in some embodiments, during the ion-beametching step, there is substantially no etching selectivity between thesecond hydrogen blocking material layer 112 and the piezoelectricmaterial layer 109, which means that the etching rate ratio of thematerial of the second hydrogen blocking material layer 112 to thematerial of the piezoelectric material layer 109 is substantially 1. Itis noted that, as the second hydrogen blocking material layer 112 isformed between the second photoresist layer PR2 and the second electrode103, and between the second photoresist layer PR2 and the piezoelectricmaterial layer 109, during the second etching step, the hydrogen-ions inthe second photoresist layer PR2 are barred from penetrating into thesecond electrode 103 and the piezoelectric layer 102 by the secondhydrogen blocking layer 104 b.

As shown in FIG. 3E, the second hydrogen blocking layer 104 b is locatedbetween the second photoresist layer PR2 and the first hydrogen blockinglayer 104 a, between the second photoresist layer PR2 and the secondelectrode 103, and between the second photoresist layer PR2 and thepiezoelectric layer 102. In detail, the second hydrogen blocking layer104 b is formed to physically contact the first hydrogen blocking layer104 a at the top surface and the sidewall of the first hydrogen blockinglayer 104 a, physically contact the second electrode 103 at the sidewallof the second electrode 103, and physically contact the piezoelectriclayer 102 at the top surface of the piezoelectric layer 102. Inaddition, as shown in the cross-section of FIG. 3E, the sidewall of thepiezoelectric layer 102 is laterally shifted from the sidewall of thesecond electrode 103. In detail, the sidewall of the piezoelectric layer102 is laterally shifted outward from the sidewall of the secondelectrode 103. In other words, in the cross-section of FIG. 3E, thewidth of the piezoelectric layer 102 is greater than the width of thesecond electrode 103. Specifically, as shown in the cross-section ofFIG. 3E, the second electrode 103 and the piezoelectric layer 102constitute a stacked structure having stepped sidewalls at both sides.Moreover, as shown in FIG. 3E, the second electrode 103 covers a part ofthe piezoelectric layer 102, thereby the top surface of thepiezoelectric layer 102 which is contacted with the second hydrogenblocking layer 104 b is uncovered by the second electrode 103. Fromanother point of view, as from the top view of FIG. 1 , the boundary ofthe second electrode 103 is within the boundary of the piezoelectriclayer 102. The other details of the second hydrogen blocking layer 104 band the piezoelectric layer 102 have been described above, and will notiterated herein.

Referring to FIG. 3E and FIG. 3F, after the second hydrogen blockinglayer 104 b and the piezoelectric layer 102 are formed, the secondphotoresist layer PR2 is removed. In some embodiments, the secondphotoresist layer PR2 may be removed by a stripping process, such as adry stripping process, a wet stripping process or a combination thereof.As mentioned above, since the second hydrogen blocking layer 104 b islocated between the second photoresist layer PR2 and the secondelectrode 103, and between the second photoresist layer PR2 and thepiezoelectric layer 102, during the stripping process of the secondphotoresist layer PR2, the second hydrogen blocking layer 104 b helpsprevent the hydrogen-ions in the second photoresist layer PR2 frompenetrating into the second electrode 103 and the piezoelectric layer102.

Still referring to FIG. 3F, a third hydrogen blocking material layer 113is formed on the second hydrogen blocking layer 104 b and thepiezoelectric layer 102. In addition, the third hydrogen blockingmaterial layer 113 is formed on the portions of the first conductivelayer 108 that are not covered by the second hydrogen blocking layer 104b and the piezoelectric layer 102. In some embodiments, the thirdhydrogen blocking material layer 113 is a conformal layer. In detail,the third hydrogen blocking material layer 113 conformally andcompletely covers the top surface and the sidewall of the secondhydrogen blocking layer 104 b, the sidewall of the piezoelectric layer102, and the portions of the first conductive layer 108 that are notcovered by the second hydrogen blocking layer 104 b and thepiezoelectric layer 102. However, the disclosure is not limited thereto.In some alternative embodiments, the third hydrogen blocking materiallayer 113 is not a conformal layer.

In some embodiments, the material of the third hydrogen blockingmaterial layer 113 may include a metal oxide. Examples of the metaloxide may include Al₂O₃, TiO₂, Fe₂O₃, ZrO₂, ZnO, CuO or Ta₂O₅. In someembodiments, the material of the third hydrogen blocking material layer113 is the same as the material of the second hydrogen blocking materiallayer 112 and the material of the first hydrogen blocking material layer111. In some alternative embodiments, the material of the third hydrogenblocking material layer 113 is different from at least one of thematerial of the second hydrogen blocking material layer 112 and thematerial of the first hydrogen blocking material layer 111. That is tosay, the material of the third hydrogen blocking material layer 113 andthe material of the second hydrogen blocking material layer 112 are thesame or not the same, and the material of the third hydrogen blockingmaterial layer 113 and the material of the first hydrogen blockingmaterial layer 111 are the same or not the same.

In some embodiments, the third hydrogen blocking material layer 113 mayhas a thickness that is greater than 200 Å. In detail, owing to havingthe thickness greater than 200 Å, the third hydrogen blocking layer 104c formed from the third hydrogen blocking material layer 113 has goodblocking ability for hydrogen-ions. In some embodiments, the thicknessof the third hydrogen blocking material layer 113 is the same as thethickness of the second hydrogen blocking material layer 112 and thethickness of the first hydrogen blocking material layer 111. In somealternative embodiments, the thickness of the third hydrogen blockingmaterial layer 113 is different from at least one of the thickness ofthe second hydrogen blocking material layer 112 and the thickness of thefirst hydrogen blocking material layer 111. That is to say, thethickness of the third hydrogen blocking material layer 113 and thethickness of the second hydrogen blocking material layer 112 are thesame or not the same, and the thickness of the third hydrogen blockingmaterial layer 113 and the thickness of the first hydrogen blockingmaterial layer 111 are the same or not the same.

In some embodiments, the third hydrogen blocking material layer 113 maybe formed with a deposition process, such as ALD or PVD. In detail, thethird hydrogen blocking material layer 113 is formed with ALD, therebythe third hydrogen blocking material layer 113 is dense enough for thethird hydrogen blocking layer 104 c formed from the third hydrogenblocking material layer 113 to have good blocking ability forhydrogen-ions. Moreover, the third hydrogen blocking material layer 113is formed with PVD, thereby there is no additional hydrogen-ions fromthe third hydrogen blocking material layer 113.

Continue referring to FIG. 3F, a third photolithography step isperformed to form a third photoresist layer PR3 on the third hydrogenblocking material layer 113. In other words, the third hydrogen blockingmaterial layer 113 is located between the third photoresist layer PR3and the piezoelectric layer 102, and between the third photoresist layerPR3 and the first conductive layer 108. In some embodiments, the thirdphotolithography step for forming the third photoresist layer PR3 mayinclude the following steps of coating a photoresist material on thethird hydrogen blocking material layer 113, exposing the photoresistmaterial with a photolithography mask (or called photomask), anddeveloping the exposed photoresist material. In some embodiments, thethird photoresist layer PR3 includes a positive photoresist materialwhich is photo-solubilized when exposed to light. In some alternativeembodiments, the third photoresist layer PR3 includes a negativephotoresist material.

Referring to FIG. 3F and FIG. 3G, a third etching step is performed tothe third hydrogen blocking material layer 113 and the first conductivelayer 108 by using the third photoresist layer PR3 as an etch mask, suchthat the third hydrogen blocking material layer 113 and the firstconductive layer 108 are etched to form the third hydrogen blockinglayer 104 c and the first electrode 101, and the portions of thesubstrate 100 that are not covered by the third hydrogen blocking layer104 c and the first electrode 101 are exposed. In other words, the thirdhydrogen blocking material layer 113 and the first conductive layer 108are simultaneously patterned by using the same mask to form the thirdhydrogen blocking layer 104 c and the first electrode 101. That is tosay, the third hydrogen blocking layer 104 c and the first electrode 101have substantially identical layout. In some embodiments, the thirdetching step is an ion-beam etching step used to pattern the thirdhydrogen blocking material layer 113 and the first conductive layer 108in a single patterning process. In detail, in some embodiments, duringthe ion-beam etching step, there is substantially no etching selectivitybetween the third hydrogen blocking material layer 113 and the firstconductive layer 108, which means that the etching rate ratio of thematerial of the third hydrogen blocking material layer 113 to thematerial of the first conductive layer 108 is substantially 1. It isnoted that, as the third hydrogen blocking material layer 113 is formedbetween the third photoresist layer PR3 and the piezoelectric layer 102,and between the third photoresist layer PR3 and the first conductivelayer 108, during the third etching step, the third hydrogen blockinglayer 104 c helps prevent the hydrogen-ions in the third photoresistlayer PR3 from penetrating into the piezoelectric layer 102 and thefirst electrode 101.

As shown in FIG. 3G, the third hydrogen blocking layer 104 c is locatedbetween the third photoresist layer PR3 and the second hydrogen blockinglayer 104 b, between the third photoresist layer PR3 and thepiezoelectric layer 102, and between the third photoresist layer PR3 andthe first electrode 101. In detail, the third hydrogen blocking layer104 c is formed to physically contact the second hydrogen blocking layer104 b at the top surface and the sidewall of the second hydrogenblocking layer 104 b, physically contact the piezoelectric layer 102 atthe sidewall of the piezoelectric layer 102, and physically contact thefirst electrode 101 at the top surface of the first electrode 101. Inaddition, as shown in the cross-section of FIG. 3G, the sidewall of thefirst electrode 101 is laterally shifted from the sidewall of thepiezoelectric layer 102. In detail, the sidewall of the first electrode101 is laterally shifted outward from the sidewall of the piezoelectriclayer 102. In other words, in the cross-section of FIG. 3G, the width ofthe first electrode 101 is greater than the width of the piezoelectriclayer 102. Specifically, as shown in the cross-section of FIG. 3G, thepiezoelectric layer 102 and the first electrode 101 constitute a stackedstructure having stepped sidewalls at both sides. Moreover, as shown inFIG. 3G, the piezoelectric layer 102 covers a part of the firstelectrode 101, thereby the top surface of the first electrode 101 whichis contacted with the third hydrogen blocking layer 104 c is uncoveredby the piezoelectric layer 102. From another point of view, as from thetop view of FIG. 1 , the boundary of the piezoelectric layer 102 iswithin the boundary of the first electrode 101. The other details of thethird hydrogen blocking layer 104 c and the first electrode 101 havebeen described above, and will not iterated herein.

After the first electrode 101 is formed, the formation of themetal-insulator-metal element MIM comprising the first electrode 101,the piezoelectric layer 102 and the second electrode 103 is thuscompleted. In detail, as mentioned above, since the second electrode 103and the piezoelectric layer 102 are formed to constitute a stackedstructure having stepped sidewalls at both sides, and the piezoelectriclayer 102 and the first electrode 101 are also formed to constitute astacked structure having stepped sidewalls at both sides, themetal-insulator-metal element MIM comprising the first electrode 101,the piezoelectric layer 102 and the second electrode 103 has a staircaseshaped stacked-structure, as shown in the cross-section of FIG. 3G.

Furthermore, after the third hydrogen blocking layer 104 c is formed,the formation of the hydrogen blocking layer 104 comprising the firsthydrogen blocking layer 104 a, the second hydrogen blocking layer 104 band the third hydrogen blocking layer 104 c is thus completed. As shownin FIG. 3G, the hydrogen blocking layer 104 covers and contacts the topsurface of the second electrode 103, and contacts a part of the topsurface of the first electrode 101 and a part of the top surface of thepiezoelectric layer 102. In detail, the hydrogen blocking layer 104physically contacts the metal-insulator-metal element MIM at the topsurface and the sidewall of the second electrode 103, the sidewall and apart of the top surface of the piezoelectric layer 102, and a part ofthe top surface of the first electrode 101. Moreover, as shown in FIG.3G, the thickness of the hydrogen blocking layer 104 that is located onand contacts the top surface of the second electrode 103 is greater thanthe thickness of the hydrogen blocking layer 104 that is located on andcontacts the top surface of the piezoelectric layer 102, and thethickness of the hydrogen blocking layer 104 that is located on andcontacts the top surface of the piezoelectric layer 102 is greater thanthe thickness of the hydrogen blocking layer 104 that is located on andcontacts the top surface of the first electrode 101.

Referring to FIG. 3G and FIG. 3H, after the third hydrogen blockinglayer 104 c and the first electrode 101 are formed, the thirdphotoresist layer PR3 is removed. In some embodiments, the thirdphotoresist layer PR3 may be removed by a stripping process, such as adry stripping process, a wet stripping process or a combination thereof.As mentioned above, since the third hydrogen blocking layer 104 c islocated between the third photoresist layer PR3 and the piezoelectriclayer 102, and between the third photoresist layer PR3 and the firstelectrode 101, during the stripping process of the third photoresistlayer PR3, the third hydrogen blocking layer 104 c helps prevent thehydrogen-ions in the third photoresist layer PR3 from penetrating intothe piezoelectric layer 102 and the first electrode 101.

Still referring to FIG. 3H, a passivation layer 105 is formed to coverthe hydrogen blocking layer 104 and the metal-insulator-metal elementMIM. In some embodiments, the passivation layer 105 may be formed withCVD, PVD, or any other suitable techniques. In some embodiments, thematerial of the passivation layer 105 may be a dielectric material, suchas silicon oxide, silicon nitride, silicon oxynitride or a combinationthereof. In some embodiments, the passivation layer 105 may has athickness that is in a range from about 200 Å to about 2000 Å. Detailsof the passivation layer 105 have been described above, and will notiterated herein.

Referring to FIG. 3H and FIG. 3I, the passivation layer 105 and thehydrogen blocking layer 104 are patterned to form a first contact holeH1 and a second contact hole H2 for exposing a contact portion P1 of thefirst electrode 101 and a contact portion P2 of the second electrode103. In detail, as shown in FIG. 3I, the first contact hole H1 is formedin the passivation layer 105 and the third hydrogen blocking layer 104c, and the second contact hole H2 is formed in the passivation layer105, the first hydrogen blocking layer 104 a, the second hydrogenblocking layer 104 b and the third hydrogen blocking layer 104 c. Insome embodiments, the first contact hole H1 and the second contact holeH2 may be formed by performing photolithography and etching processes.

Then, referring back to FIG. 2 , a first contact terminal 106 is formedon the passivation layer 105 to be electrically connected to the firstelectrode 101 through the first contact hole H1, and a second contactterminal 107 is formed on the passivation layer 105 to be electricallyconnected to the second electrode 103 through the second contact holeH2. In detail, the first contact terminal 106 is formed to beelectrically connected to the contact portion P1 of the first electrode101, and the second contact terminal 107 is formed to be electricallyconnected to the contact portion P2 of the second electrode 103. In someembodiments, the materials of the first contact terminal 106 and thesecond contact terminal 107 may respectively include, but not limitedto, silver (Ag), titanium (Ti), tantalum (Ta), ruthenium (Ru), aluminum(Al), copper (Cu), gold (Au), or a combination thereof, or the like. Sofar, the manufacture of the piezoelectric device 10 according to someembodiments is completed. The first contact terminal 106 and the secondcontact terminal 107 provide the input/output terminals for receivingthe electrical voltage for controlling the physical displacement of thepiezoelectric device 10. Details of the first contact terminal 106 andthe second contact terminal 107 have been described above, and will notiterated herein.

In the above-mentioned embodiments shown in FIG. 3A to FIG. 3I, sincebefore each photoresist layer utilized as an etch mask for forming themetal-insulator-metal element MIM (i.e., the first photoresist layerPR1, the second photoresist layer PR2, the third photoresist layer PR3)is formed, the corresponding hydrogen blocking material layer (i.e., thefirst hydrogen blocking material layer 111, the second hydrogen blockingmaterial layer 112, the third hydrogen blocking material layer 113) isalready formed, the hydrogen-ions in the photoresist layer are barredfrom penetrating into the metal-insulator-metal element MIM during theetching process and the striping process by the corresponding hydrogenblocking material layer. From another point of view, since the hydrogenblocking layer 104 includes the first hydrogen blocking layer 104 a, thesecond hydrogen blocking layer 104 b and the third hydrogen blockinglayer 104 c, the first hydrogen blocking layer 104 a is formed to coversand contacts the top surface of the second electrode 103, the secondhydrogen blocking layer 104 b is formed to covers the second electrode103 and contacts the top surface of the piezoelectric layer 102, and thethird hydrogen blocking layer 104 c is formed to covers the secondelectrode 103 and the piezoelectric layer 102 and contacts the topsurface of the first electrode 101, during the manufacture of thepiezoelectric device 10, each of the first hydrogen blocking layer 104a, the second hydrogen blocking layer 104 b and the third hydrogenblocking layer 104 c helps prevent the hydrogen-ions of the photoresistlayer from penetrating into the metal-insulator-metal element MIM. Basedon the above discussion, it is noted that owing to arranging thehydrogen blocking layer 104, the the amount of the hydrogen-ionsexisting in the metal-insulator-metal element MIM of the piezoelectricdevice 10 can be reduced, and the reliability of the piezoelectricdevice 10 can be improved.

When compared with the piezoelectric device without the hydrogenblocking layer, due to the arrangement of the additional hydrogenblocking layer, the amount of the hydrogen-ions included in themetal-insulator-metal element MIM of the piezoelectric device is reducedby about 50%.

Moreover, during the reliability test under the same conditions, whencompared with the failure rate of more than 50% for the piezoelectricdevice without the hydrogen blocking layer, the piezoelectric devicedesigned with at least one additional hydrogen blocking layer based oncertain previous embodiments has a failure rate approaching zero.Furthermore, the piezoelectric device designed with at least oneadditional hydrogen blocking layer based on certain previous embodimentsoffers a higher breakdown voltage. When compared with the piezoelectricdevice without the hydrogen blocking layer, a breakdown voltagedifference equal to or greater than 20V can be observed. Based on theabove results, through the arrangement of the hydrogen blocking layer inthe piezoelectric device, the performance and reliability of thepiezoelectric device can be significantly improved.

In the embodiments of FIG. 1 and FIG. 2 , the metal-insulator-metalelement MIM has a staircase shaped stacked-structure. However, thedisclosure is not limited thereto. Possible modifications andalterations may be made to the configuration of themetal-insulator-metal element MIM. Such modifications and alterationswill be described below with reference to FIG. 4 and FIG. 5 , which areprovided for illustration purposes, and are not construed as limitingthe present disclosure.

FIG. 4 is a schematic cross-sectional view illustrating a piezoelectricdevice in accordance with alternative embodiments. Referring to FIG. 4and FIG. 2 , the piezoelectric device 20 a of FIG. 4 is similar to thepiezoelectric device 10 of FIG. 2 that taken along line A-A′, hence thesame reference numerals are used to refer to the same or liked parts,and its detailed description will be omitted herein. The differencesbetween the piezoelectric device 20 a and the piezoelectric device 10will be described below.

Referring to FIG. 4 , in the piezoelectric device 20 a, the sidewalls ofthe first electrode 101, the piezoelectric layer 102 and the secondelectrode 103 are vertically aligned. Further, as shown in FIG. 4 , thesidewall of the hydrogen blocking layer 104 is vertically aligned withthe sidewalls of the first electrode 101, the piezoelectric layer 102and the second electrode 103. From another point of view, in thepiezoelectric device 20 a, the hydrogen blocking layer 104 is disposedright above the second electrode 103 and physically contacts themetal-insulator-metal element MIM at the top surface of the secondelectrode 103. In detail, as shown in FIG. 4 , the hydrogen blockinglayer 104 physically contacts the second electrode 103 at the topsurface of the second electrode 103, and does not physically contact thepiezoelectric layer 102 and the first electrode 101. In someembodiments, as shown in FIG. 4 , the hydrogen blocking layer 104 is asingle layer. However, the disclosure is not limited thereto. In somealternative embodiments, the hydrogen blocking layer 104 of thepiezoelectric device 20 a is a multilayer structure.

FIG. 5 is a schematic cross-sectional view illustrating a piezoelectricdevice in accordance with alternative embodiments. Referring to FIG. 5and FIG. 4 , the piezoelectric device 20 b of FIG. 5 is similar to thepiezoelectric device 20 a of FIG. 4 , and the main difference betweenthem lies in that, in the piezoelectric device 20 b, the sidewalls ofthe first electrode 101, the piezoelectric layer 102 and the secondelectrode 103 are tilted sidewalls; while in the piezoelectric device 20a, the sidewalls of the first electrode 101, the piezoelectric layer 102and the second electrode 103 are vertically aligned. That is to say, inthe piezoelectric device 20 b, the metal-insulator-metal element MIM hasa taper profile. Further, as shown in FIG. 5 , the sidewall of thehydrogen blocking layer 104 is also a tilted sidewall. In someembodiments, an angle θ between the tilted sidewall of each of the firstelectrode 101, the piezoelectric layer 102, the second electrode 103 andthe hydrogen blocking layer 104 and the normal direction (illustrated bya dash line shown in FIG. 5 ) of the substrate 100 may range fromgreater than 0° to about 40°. In some embodiments, the method of formingthe metal-insulator-metal element MIM having a taper profile of thepiezoelectric device 20 b may include the step of adjusting theincidence angle of the ion beam during the ion-beam etching step withrespect to the normal direction of the substrate 100.

FIG. 6A and FIG. 6B are schematic views illustrating one exemplaryapplication of the piezoelectric device in accordance with someembodiments. Referring to FIG. 6A and FIG. 6B, two piezoelectric devices1000 are used for controlling a variable focus optical system. It isnoted that the piezoelectric device 1000 may be implemented by using thepiezoelectric device 10, piezoelectric device 20 a or piezoelectricdevice 20 b in the above-mentioned embodiments. Moreover, the number andthe type(s) of the piezoelectric devices 1000 illustrated in FIG. 6A andFIG. 6B are merely for illustrative purposes, and the disclosure is notlimited thereto. In some alternative embodiments, one piezoelectricdevice 1000 or more than two piezoelectric devices 1000 may be used forcontrolling a variable focus optical system.

As shown in FIG. 6A and FIG. 6B, the variable focus optical systemincludes a glass carrier 2000, a glass thin membrane 2004 and atransparent polymer 2002. The piezoelectric devices 1000 are disposed onthe glass thin membrane 2004. The transparent polymer 2002 withwell-defined optical index may be used to fill up the space between theglass carrier 2000 and the glass thin membrane 2004. As mentioned above,when a voltage is applied to the piezoelectric devices 1000, thepiezoelectric layer of each piezoelectric device 1000 can stretch orcompress to provide a physical displacement in a direction normal to thesurface of the glass thin membrane 2004. As a result, each piezoelectricdevice 1000 forces the glass thin membrane 2004 so as to change theposition of the glass thin membrane 2004 and/or the shape of the glassthin membrane 2004. That is, the piezoelectric device 1000 may functionas an actuator. As shown in FIG. 6B, the piezoelectric devices 1000force the glass thin membrane 2004 to bend accordingly. At this time, abeam of light L, after passing through the glass carrier 2000, thetransparent polymer 2002 and the glass thin membrane 2004, gets focusedat a focus point F, as shown in FIG. 6B. It is noted that since theamount of the physical displacement generally depends upon the voltageapplied to the piezoelectric device, by adjusting the magnitude of theapplied voltage, the position of the focus point F will change.Furthermore, when the piezoelectric devices 1000 are in standby mode, noforce is applied to the glass thin membrane 2004, thereby a beam oflight L passes through the glass carrier 2000, the transparent polymer2002 and the glass thin membrane 2004 without deviation, as shown inFIG. 6A.

In some embodiments, the variable focus optical system may be comprisedwithin a package of a semiconductor chip having one or more imagesensors. For example, in some embodiments, the variable focus opticalsystem may be configured to focus light onto an integrated chip havingone or more image sensing devices (e.g., CMOS image sensors, CCD imagesensors). It will be appreciated that the variable focus optical systemshown in FIG. 6A and FIG. 6B is merely one example showing possibleapplications of the piezoelectric device 1000. People skilled in the artcan understand other possible applications of the piezoelectric device1000.

In accordance with some embodiments of the present disclosure, apiezoelectric device including a substrate, a metal-insulator-metalelement, a hydrogen blocking layer, a passivation layer, a first contactterminal and a second contact terminal is provided. Themetal-insulator-metal element is disposed on the substrate. The hydrogenblocking layer is disposed on the metal-insulator-metal element. Thepassivation layer covers the hydrogen blocking layer and themetal-insulator-metal element. The first contact terminal iselectrically connected to the metal-insulator-metal element. The secondcontact terminal is electrically connected to the metal-insulator-metalelement.

In accordance with alternative embodiments of the present disclosure, apiezoelectric device including a substrate, a first electrode, apiezoelectric layer, a second electrode, a hydrogen blocking layer, apassivation layer, a first contact terminal and a second contactterminal is provided. The first electrode is disposed on the substrate.The piezoelectric layer is disposed on the first electrode. The secondelectrode is disposed on the piezoelectric layer. The hydrogen blockinglayer is disposed on the second electrode and over the substrate. Thepassivation layer covers the hydrogen blocking layer, the secondelectrode, the piezoelectric layer and the first electrode. The firstcontact terminal is electrically connected to the first electrode. Thesecond contact terminal is electrically connected to the secondelectrode.

In accordance with yet alternative embodiments of the presentdisclosure, a method of forming a piezoelectric device including atleast the following steps is provided. A first conductive layer, apiezoelectric material layer and a second conductive layer aresequentially formed on a substrate. A first hydrogen blocking materiallayer is formed on the second conductive layer. The first hydrogenblocking material layer is patterned to form a first hydrogen blockinglayer. A passivation layer is formed to cover the first hydrogenblocking layer.

The foregoing outlines features of several embodiments so that thoseskilled in the art may better understand the aspects of the presentdisclosure. Those skilled in the art should appreciate that they mayreadily use the present disclosure as a basis for designing or modifyingother processes and structures for carrying out the same purposes and/orachieving the same advantages of the embodiments introduced herein.Those skilled in the art should also realize that such equivalentconstructions do not depart from the spirit and scope of the presentdisclosure, and that they may make various changes, substitutions, andalterations herein without departing from the spirit and scope of thepresent disclosure.

What is claimed is:
 1. A piezoelectric device, comprising: a substrate;a metal-insulator-metal element disposed on the substrate, wherein themetal-insulator-metal element comprises a first electrode, apiezoelectric layer and a second electrode sequentially stacked on thesubstrate; a hydrogen blocking layer disposed on themetal-insulator-metal element, wherein the hydrogen blocking layercovers and contacts a top surface of the second electrode and contacts atop surface of the first electrode and a top surface of thepiezoelectric layer, a thickness of the hydrogen blocking layer that islocated on and contacts the top surface of the second electrode isgreater than a thickness of the hydrogen blocking layer that is locatedon and contacts the top surface of the piezoelectric layer, and thethickness of the hydrogen blocking layer that is located on and contactsthe top surface of the piezoelectric layer is greater than a thicknessof the hydrogen blocking layer that is located on and contacts the topsurface of the first electrode; a passivation layer covering thehydrogen blocking layer and the metal-insulator-metal element; a firstcontact tenninal electrically connected to the metal-insulator-metalelement; and a second contact terminal electrically connected to themetal-insulator-metal element.
 2. The piezoelectric device of claim 1,wherein the hydrogen blocking layer physically contacts themetal-insulator-metal element at a top surface of the second electrode.3. The piezoelectric device of claim 1, wherein a material of thehydrogen blocking layer comprises Al₂O₃, TiO₂, Fe₂O₃, ZrO₂, ZnO, CuO orTa₂O₅.
 4. The piezoelectric device of claim 1, wherein a material of thepiezoelectric layer comprises lead zirconate titanate.
 5. Thepiezoelectric device of claim 1, wherein in a top view, a span of thefirst electrode is greater than a span of the piezoelectric layer, and aspan of the piezoelectric layer is greater than a span of the secondelectrode.
 6. A piezoelectric device, comprising: a substrate; a firstelectrode disposed on the substrate; a piezoelectric layer disposed onthe first electrode; a second electrode disposed on the piezoelectriclayer; a hydrogen blocking layer disposed on the second electrode andover the substrate, wherein the hydrogen blocking layer comprises afirst hydrogen blocking layer, a second hydrogen blocking layer and athird hydrogen blocking layer, the first hydrogen blocking layercontacts a top surface of the second electrode, the second hydrogenblocking layer covers the first hydrogen blocking layer and contacts atop surface of the piezoelectric layer,and the third hydrogen blockinglayers covers the second hydrogen blocking layer and contacts a topsurface of the first electrode; a passivation layer covering thehydrogen blocking layer, the second electrode, the piezoelectric layerand the first electrode; a first contact tenninal electrically connectedto the first electrode; and a second contact terminal electricallyconnected to the second electrode.
 7. The piezoelectric device of claim6, wherein the hydrogen blocking layer is disposed right above thesecond electrode and physically contacts the second electrode at a topsurface of the second electrode.
 8. The piezoelectric device of claim 7,wherein sidewalls of the first electrode, the piezoelectric layer andthe second electrode are tilted sidewalls.
 9. The piezoelectric deviceof claim 7, wherein sidewalls of the first electrode, the piezoelectriclayer and the second electrode are vertically aligned.
 10. Thepiezoelectric device of claim 6, wherein materials of the first hydrogenblocking layer, the second hydrogen blocking layer and the thirdhydrogen blocking layer are the same.
 11. The piezoelectric device ofclaim 6, wherein in a cross-section, the first electrode, thepiezoelectric layer and the second electrode constitute a staircaseshaped stacked-structure.
 12. The piezoelectric device of claim 6,wherein the passivation layer and the hydrogen blocking layer have afirst contact hole and a second contact hole, the first contact terminalis electrically connected to the first electrode through the firstcontact hole, and the second contact terminal is electrically connectedto the second electrode through the second contact hole.
 13. Thepiezoelectric device of claim 6, wherein a material of the hydrogenblocking layer comprises Al₂O₃, TiO₂, Fe₂O₃, ZrO₂, ZnO, CuO or Ta₂O₅.14. The piezoelectric device of claim 6, wherein in a top view, shapesof the first electrode, the piezoelectric layer and the second electrodeare arranged as concentric circles.
 15. The piezoelectric device ofclaim 6, wherein at least one of the first hydrogen blocking materiallayer, the second hydrogen blocking material layer and the thirdhydrogen blocking material layer has a thickness that is greater than200 Å.
 16. A method of forming a piezoelectric device, comprising:sequentially forming a first conductive layer, a piezoelectric materialayer and a second conductive layer on a substrate; forming a firsthydrogen blocking material layer on the second conductive layer;patterning the first hydrogen blocking material layer to form a firsthydrogen blocking layer; and forming a passivation layer to cover thefirst hydrogen blocking layer, wherein before forming the passivationlayer to cover the first hydrogen blocking layer, further comprising:forming a second hydrogen blocking material layer on the first hydrogenblocking layer; forming a second photoresist layer on the secondhydrogen blocking material layer; performing a second etching step tothe second hydrogen blocking material layer and the piezoelectricmaterial layer by using the second photoresist layer as an etch mask toform a second hydrogen blocking layer and a piezoelectric layer; forminga third hydrogen blocking material layer on the piezoelectric layer andon the second hydrogen blocking layer; forming a third photoresist layeron the third hydrogen blocking material layer; and performing a thirdetching step to the third hydrogen blocking material layer and the firstconductive layer by using the third photoresist layer as an etch mask toform a third hydrogen blocking layer and a first electrode.
 17. Themethod of claim 16, wherein patterning the first hydrogen blockingmaterial layer to form the first hydrogen blocking layer comprises:forming a first photoresist layer on the first hydrogen blockingmaterial layer; and performing a first etching step to the firsthydrogen blocking material layer and the second conductive layer byusing the first photoresist layer as an etch mask to form the firsthydrogen blocking layer and a second electrode.
 18. The method of claim16, wherein at least one of the first hydrogen blocking material layer,the second hydrogen blocking material layer and the third hydrogenblocking material layer is formed by atomic layer deposition (ALD) orphysical vapor deposition (PVD).
 19. The method of claim 16, wherein atleast one of the first etching step, the second etching step and thethird etching step includes an ion-beam etching step.
 20. The method ofclaim 16, wherein the piezoelectric material layer is formed by PVD or asol-gel process.